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UDC 621.793.182

EVALUATION OF SPRAY COEFFICIENT IN DEVELOPMENT TECHNOLOGY OF THE DEVICES FOR PLASMA ELECTRONICS

A. S. Aref’ev, PhD (technical sciences), full professor, RSREU, Ryazan; This email address is being protected from spambots. You need JavaScript enabled to view it.
G. P. Gololobov, PhD (technical sciences), associate professor, RSREU, Ryazan; This email address is being protected from spambots. You need JavaScript enabled to view it.
D. V. Suvorov, PhD (technical sciences), associate professor, RSREU, Ryazan; This email address is being protected from spambots. You need JavaScript enabled to view it.
M. A. Serpova, post-graduate student, RSREU, Ryazan; This email address is being protected from spambots. You need JavaScript enabled to view it.
E. V. Slivkin, lead engineer, RSREU, Ryazan; This email address is being protected from spambots. You need JavaScript enabled to view it.

The article presents various cathode sputtering regimes based on the cascade collision theory of Zygmund. The relevance of studying the cathode sputtering process in relation to various fields of science and technology, in particular, the technology of creating devices for vacuum and plasma electronics, is shown. The aim of the work is to develop a methodology for estimating the coefficient of atomization of a material in the process of cathode sputtering when creating devices for plasma electronics. Estimation of the spray coefficient based on the thermal peak regime as the most probable is given. A feature of the presented method for calculating the local sputtering coefficient is that the estimate is based on the erosion model of the collision theory in cathode sputtering, taking into account the melting and evaporation processes of the cathode material. A function describing the distribution of sputtered cathode particles with respect to the component pulse normal to the atomized surface is determined.

Key words: сathode sputtering, solid surface, ion beam, erosion processes, sputtering coefficient, thermal peaks regime, high-temperature field, atomized atoms, gas-discharge devices, collisional theory, calculation technique, electron microscopic examination of a surface.

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